The MAU has several characterisation and fabrication facilities:

  • Electron microscopy and microanalysis
  • Scanning probe microscopy
  • X-ray characterisation
  • Nanophotonics lab
  • Cathodoluminescence microanalysis lab
  • Thin film vacuum deposition lab

Scanning electron microscopes (SEM)

  • ThermoFisher (FEI) Helios G4 PFIB UXe DualBeam
  • Zeiss Supra 55VP SEM with RAITH E-beam Lithography System & EBSD
  • ThermoFisher (FEI) DB235 DualBeam with Delmic SPARC and SECOM
  • FEI Quanta 200 ESEM with Cathodoluminescence (CL) Spectroscopy and Moran Scientific CL Mapping System
  • Zeiss EVO LS15 with extended pressure, Bruker SDD EDS Quantax 400 system and gunshot residue (GSR)

Transmission electron microscope (TEM)

JEOL JEM F200 TEM

Nanophotonics Lab

The Nanophotonics lab has state of the art capabilities measuring quantum states of light. It includes multiple excitation sources, pulsed and cw, capability to detect single photons and perform fluorescence lifetime imaging. It has a confocal microscope with diffraction limited resolution, low temperature spectroscopy and sub nanometer scanning stage.

Scanning probe microscopes (SPM)

X-ray diffraction (XRD)

  • Bruker D8 Discover XRD

 Spectroscopy

  • Agilent Cary 7000 UMS
  • Perkin Elmer Lambda 950 UV/VIS/NIR Spectrometer
  • Varian Cary Eclipse Fluorescence Spectrometer
  • JA Woollam Variable Angle Ellipsometer
  • Malvern Zetasizer Nano ZS

Thin film coating chambers

  • Edwards EO6 Deposition System
  • Denton DV502 Turbo Deposition System
  • Dynavac CE12-14s Evaporation System
  • Shannon E-beam Evaporation System
     

To find out how to gain access to these research instruments and MAU, visit the user access and registration in this website.