Edwards EO6 Deposition System
The Edwards EO6 Deposition System is:
Diffusion pumped system to 10-6 Torr
DC and RF sputtering
Thermal evaporation of up to 2 sources sequentially
Substrate heating to 400°C
Thickness monitoring via quartz crystal microbalance
Denton DV502 Turbo Deposition System
The Denton DV502 Turbo Deposition System is:
Turbo pumped system to 10-6 Torr
Thermal evaporation of up to 2 sources sequentially
Substrate heating to 400°C
Thickness monitoring via quartz crystal microbalance
Dynavac CE12-14s Evaporation System
The Dynavac CE12-14s Evaporation System is:
Diffusion pumped system to 10-6 Torr
DC and RF sputtering of 2 sources simultaneously
Reactive sputtering with Oxygen atmosphere
Substrate heating to 400°C
Shannon E-beam Evaporation System
The Shannon E-beam Evaporation System is:
Diffusion pumped system to 10-6 Torr
E-beam evaporation
Substrate heating to 400°C
Thickness monitoring via quartz crystal microbalance